• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    An apparatus and method for treating a cathode material provided on a surface of a continuous thin-film substrate and a treated thin-film cathode having increased smoothness are disclosed. A web of untreated cathode material is moved between a feed mechanism and a take-up mechanism, and passed through a treatment station. The web of cathode material typically includes areas having surface defects, such as prominences extending from the surface of the cathode material. The surface of the cathode material is treated with an abrasive material to reduce the height of the prominences so as to increase an 85 degree gloss value of the cathode material surface by at least approximately 10. The web of cathode material may be subjected to a subsequent abrasive treatment at the same or other treatment station. Burnishing or lapping film is employed at a treatment station to process the cathode material. An abrasive roller may alternatively be used to process the web of cathode material. The apparatus and method of the present invention may also be employed to treat the surface of a lithium anode foil so as to cleanse and reduce the roughness of the anode foil surface.
    公开号:US20010001053A1
    申请号:US09/730,054
    申请日:2000-12-05
    公开日:2001-05-10
    发明作者:Eric Hanson；Richard Kooyer
    申请人:Minnesota Mining and Manufacturing Co；
    IPC主号:H01M4-13
    专利说明:
    [2] 2. This invention relates generally to energy storing devices, and more particularly, to an apparatus and method for treating a cathode material provided on a thinfilm substrate. BACKGROUND OF THE INVENTION
    [3] 3. The demand for new and improved cicctronic and electromechanical systems has placed increased pressure on the manufacturers of energy storing device g to develop battery technologies that provide for high energy generation in a low-volume package. A number of advanced battery technologies have recently been developed, such as metal hydride (e.g., Ni—MH), lithium-ion, and lithium polymer cell technologies, which would appear to provide the requisite level of energy production and safety margins for many commercial and consumer applications. Such advanced battery technologies, however, often exhibit characteristics that provide challenges for the manufacturers of advanced energy storage devices.
    [4] 4. High-density, thin-film lithium batteries, for example, are typically fabricated using an anode comprising metallic lithium, lithium-metal alloy, lithium metal oxide or a lithium-carbon composite deposited on a substrate. In accordance with one battery configuration, the cathode comprises a metal oxide, typically a lithiated vanadium, or a modification of such an oxide, deposited on a metallic substrate. A solid polymer electrolyte film is typically situated between the active anode and cathode materials. Electrochemical cells, modules, and batteries may be fabricated using this basic anode/electrolyte/cathode thin-film laminate structure.
    [5] 5. Manufacturers of high-density lithium batteries are currently faced with the challenge of producing reliable thin-film lithium cells within a high-volume manufacturing environment. A particular failure mechanism which has yet to be addressed and remedied in the prior art involves the instability of cell voltages which is often observed after forming thin-film electrochemical cells through use of a wrapping process. Another related failure mechanism involves the development of electrical shorts within the cells after completion of the wrapping process.
    [6] 6. There is a need in the advanced battery manufacturing industry for a method and apparatus for fabricating high density, thin-film lithium cells and batteries which exhibit a reduced tendency for voltage instabilities and electrical shorts. The present invention fulfills these and other needs. SUMMARY OF THE INVENTION
    [7] 7. The present invention is directed to an apparatus and method for treating a cathode material provided on a surface of a thin-film substrate, and a treated thin-film cathode having increased smoothness. A web of untreated cathode material is moved between a feed mechanism and a take-up mechanism, and passed through a treatment station. The web of cathode material typically includes areas having surface defects, such as prominences extending from the surface of the cathode material. The surface of thle cathode material is treated with an abrasive material to reduce the height of the prominences so as to increase an 85 degree gloss value of the material by at least approximately 10. The web of cathode material may he subjected to a subsequent abrasive treatment at the same or other treatment station. Burnishing or lapping film is employed at a treatment station to process the cathode material. An abrasive roller may alternatively be used to process the web of cathode material. The apparatus and method of the present invention may also be employed to treat the surface of a lithium anode foil so as to cleanse and reduce the roughness of the anode foil surface.
    [8] 8. The above summary of the present invention is not intended to describe each embodiment or every implementation of the present invention. Advantages and attainments, together with a more complete understanding of the invention, will become apparent and appreciated by referring to the following detailed description and claims taken in conjunction with the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS
    [9] 9.FIG. 1A illustrates an embodiment of a solid-state, thin-film electrochemical cell having a prismatic configuration;
    [10] 10.FIG. 1B is an illustration of another electrochemical cell embodiment having a prismatic configuration;
    [11] 11. FIGS. 2A-2C illustratc various embodiments of a thin-film electrochemical cell;
    [12] 12.FIG. 3 is a depiction of a cathode coating provided on a thin-film substrate, with two surface defects shown entrapped between the cathode coating and an electrolyte material layer;
    [13] 13.FIG. 4 is a depiction of a cathode coating provided on a thin-film substrate whdiclh has experienced tenting due to entrapment of a surface defect between the cathode coating and an electrolyte material layer;
    [14] 14.FIG. 5 illustrates an apparatus for treating a cathode material or an anode material provided on a continuous thin-film substrate in accordance with an embodiment of the present invention;
    [15] 15.FIG. 6 is a more detailed illustration of an apparatus for treating a cathode material or an anode material provided on a continuous thin-film substrate in accordance with another embodiment of the present invention; and
    [16] 16.FIG. 7 is an illustration of another embodiment of an apparatus for treating a cathode material or an anode material provided on a continuous thin-film substrate.
    [17] 17. While the invention is amenable to various modifications and alternative forms, specifics thereof have been shown by way of example in the drawings and will be described in detail. It is to be understood, however, that the intention is not to limit the invention to the particular embodiments described. On the contrary, the intention is to cover all modifications, equivalenrts, and alternatives falling within the spirit and scope of the invention as defined by the appended claims. DETAILED DESCRIPTION OF THE EMBODIMENTS
    [18] 18. In the following description of the illustrated embodiments, reference is made to the accompanying drawings which form a part hereof, and in which is shown by way of illustration, various embodiments in which the invention may be practiced. It is to be understood that the embodiments may be utilized and structural changes may be made without departing from the scope of the present invention.
    [19] 19. Referring to the drawings, and more particularly to FIGS. 1A-1B, there is illustrated an embodiment of a solid-state, thin-film electrochemical cell which may be utilized in the fabrication of a rechargeable electrochemical generator in accordance with the principles of the present invention. The electrochemical cell 20 is shown as having a flat wound prismatic configuration in which a thin-film solid electrolyte 26 is disposed between a film 24 constituting an anode and a film 28 constituting a cathode.
    [20] 20. A central cathode current: collector film 30 is disposed between each of the cathode films 28. The anode films 24 are laterally offset relative to the cathode current collector 30 so as to expose the anode 24 along a first edge 25 of the cell 20, and to expose them cathode current collector 30 along a second edge 23 of the cell 20. The embodiment shown in FIGS. 1A-1B may include a core element 22, such as a foam or metal spring element, about which the thin-film electrochemical cell 20 is wound.
    [21] 21. In FIGS. 2A-2C, there is illustrated various embodiments of a thin-film electrochemical cell which may be used in the fabrication of a rechargeable energy storing device. As is shown in FIG. 2A, a thin-film electrochemical cell may be packaged in a “jelly roll” configuration so as to form a generally cylindrical cell structure in which a first edge 42 of the cell forms a positive contact 43, and a second edge 44 forms a negative contact 45. The positive and negative contacts 43, 45 are formed typically by use of a known metal spraying technique.
    [22] 22.FIGS. 2B and 2C illustrate alternative packaging configurations for a thin-film rechargeable electrochemical cell. A flat roll configuration, shown in FIG. 2B, or a flat stack configuration, shown in FIG. 2C, provides for the aggregation of a relatively large thin-film cell surface area within a relatively small packaging configuration. Such geometries minimize voltage losses and allow for the efficient transfer of electrical, energy to and from the multi-layered cell structure.
    [23] 23. In accordance with one embodiment, and with further reference to FIGS. 1A-1B, the electrochemical cell 20 includes a solid polymer electrolyte 26 which constitutes an ion transporting material, a lithium metal anode 24, and an active vanadium oxide cathode 28. These film elements are fabricated to form a thin-film laminated prismatic structure, which may include an insulation film such as polypropylene film. A known metallization process is employed to form current collecting contacts along the edges 25, 23 of the anode 24 and cathode 28 films, respectively.
    [24] 24. The cell shown in FIGS. 1A-1B, includes a central cathode current collector 30 which is disposed between each of the two cathode films 28 to form a bi-face cell configuration. A mono-face cell configuration may alternatively be employed in which a single cathode collector 30 is associated with a single anode/electrolyte/cathode element combination. In this configuration, an insulating film is typically disposed between individual anode/electrolyte/cathode/collector element combinations. The various components of the electrochemical cells depicted generally in the figures may be fabricated and packaged in accordance with the methodologies disclosed in U.S. Pat. Nos. 5,423,110, 5,415,954, and 4,897,917, the contents of which is incorporated herein by reference.
    [25] 25. In general, it has been observed that coated cathode films of lithium polymer batteries are subject to certain types of failure, depending on the particular method of preparation. It has been found that the presence of particulate defects, agglomerates, and other surface irregularities of the cathode coating typically results in a significant decrease in electrical performance of an electrochemical cell, which often leads to catastrophic failure of the cell. FIG. 4, for example, illustrates a phenomenon termed “tenting” which, if left unaddressed, often leads to a progressive reduction in electrochemical generator performance.
    [26] 26. Turning to FIG. 3, there is depicted a cathode coating 70 provided on a substrate 72, such as a continuous thin-film metallic web. During a typical cathode coating process, surface defects and other irregularities may develop or otherwise be deposited on the cathode coating 70. A protrusion of cathode material 74, for example, or other surface defect 76, such as a particulate contaminant, may result in tenting at the solid polymer electrolyte and the cathode coating interface. Tenting may also occur by entrapment of air during lamination of the solid polymer electrolyte 78 onto the cathode coating 70.
    [27] 27. A location of the cathode coating 70 which is subject to tenting generally experiences increased interfacial resistance, and defects penetrating into the laminated electrolyte effectively thin the electrolyte layer. Such locations are particularly susceptible to dendrite formation and mechanical/electrical failure.
    [28] 28. As is best shown in FIG. 3, a defect 76 on the surface of the cathode coating 70 protrudes into the solid polymer electrolyte layer 78 which is typically applied to the cathode coating 70. Such defects, if sufficient in height or size, have been identified as a primary contributor to dendrite growth and buildup. Such defects 76 have also been identified as a primary contributor to electrical shorting which often renders an electrochemical cell either unreliable or non-functional for its intended purpose.
    [29] 29. The deleterious effects resulting from defect entrapment and tenting as discussed above are significantly reduced in impact, or altogether eliminated, by employment of a treatment methodology in accordance with the principles of the present invention. It has been determined by the inventors that abrasively treating the cathode coating 70 to a degree sufficient to decrease the size and/or number of surface formations and defects on the cathode coating 70 significantly reduces incidences of tenting, which results in a concomitant reduction in electrical shorts within the electrochemical cell and improved electrochemical performance.
    [30] 30. In order to achieve these and other desirable results, the cathode coating 70 should be treated in a manner which reduces the impact of surface defect presence, yet does not adversely disturb the cathode coating and binder matrix. For example, the cathode coating 70 is typically, but not necessarily, processed in an uncured state. As such, the binder remains relatively soft which tends to complicate the treatment procedure. A typical thin-film cathode coating, for example, comprises approximately 63% by weight of oxide, 3% by weight of conductive carbon, and 34% by weight of binder. In terms of volume, each of the oxide and binder materials constitutes about 50% of the coating volume.
    [31] 31. In this configuration, the melting point of the cathode material/binder coating may be approximately 45° Celsius (C.). Elevating a process temperature above the 45° C. melting point typically results in flowing of thie binder material, which causes undesirable sticking and other process complications. It hlas been found that tIle selection of binder material has a greater impact on the burnishing characteristics of the cathode coating matrix than does the selection of the oxide material.
    [32] 32. Various characteristics of a treated cathode coating 70 may be monitored to determine the extent and sufficiency of the treatment procedure. One such characteristic is the gloss of the cathode coating 70 prior to and after treatment. In accordance with one embodiment, improved cathode coating performance and characteristics area realizable when an 85 degree gloss reading of the cathode material after treatment is increased by approximately 10.
    [33] 33. It is noted that the 85 degree gloss reading measurement is a standard procedure by which the roughness of a film may be determined. In general, a cathode coating 70 will be considered sufficiently “treated” in accordance with the principles of the present invention if the 85 degree gloss reading of the cathode material after treatment is increased by approximately 10. In some applications, it may be desirable that cathode film coatings for use in lithium batteries be treated to increase an 85 degree gloss reading by at least 20, and in other applications, by at least 40.
    [34] 34. Table 1 below provides 85 degree gloss values obtained from a cathode coating prior to and after a treatment procedure in accordance with the principles of the present invention. The data associated with the First Treatment was obtained by treating a cathode coating sample at a single treatment station. Thle data associated with the Second Treatment was obtained by treating a cathode coating sample at a first treatment station, and subsequently treating the sample at a second treatment station. TABLE 1 85 Degree Gloss Readings (dimensionless)Initial Pre- Treatment First Second Stationary Values Treatment Treatment SpotReading 1 12.90 31.80 46.20 58.50 2 12.80 26.00 39.10 53.10 3 12.60 21.50 36.70 53.80 4 12.00 23.30 28.70 52.40 5 13.30 21.30 26.30 47.60 Average 12.72 24.78 35.40 53.08 Std. Dev. 0.48 4.35 8.06 3.89
    [35] 35. Five 85 degree gloss readings were taken at different locations of the cathode material prior to performing a burnishing or lapping procedure associated with the First and Second Treatments. The average 85 degree gloss value was 12.72 with a standard deviation of 0.48. Five separate 85 degree gloss readings were taken at different locations of the cathode material smple after the material had been treated with 5 micron lapping film during the First Treatment. The gloss readings for the first Treatmnent averaged at 24.78, with a standard deviation of 4.35.
    [36] 36. The Second Treatment procedure involved burnishing the cathode material with 5 micron lapping film at a first treatment station, followed by a subsequent burnishing treatment using 2 micron lapping film at a second treatment station. Five separate 85 degree gloss readings were taken at separate locations of the cathode material sample, wiltl thie average 85 degree gloss value averaging at 35.40 and a standard deviation of 8.06. For purposes of comparison, burnishing was conducted on a section of the cathode material web that was not moving at the time of burnishing. The stationary cathode material sample was burnished using 5 micron lapping film for a duration of approximately 5 minutes. Five 85 degree gloss readings were taken from different locations of the stationary web which averaged 53.08, with a standard deviation of 3.89.
    [37] 37. It was apparent that the lapping or burnishing technique yielded an increased smoothness or gloss to the cathode coated film. In general, experiments evaluating electrochemical cell performance have demonstrated that burnished cathode films, such as that indicated by higher 85 degree gloss readings, operate with a lower incidence of failure due to shorts, dendrite formation or other similar problems than did previously prepared cathode films constructed of similar materials but manufactured without the lapping or burnishing treatment.
    [38] 38. Another characteristic of the cathode coating which may be monitored to determine the sufficiency of a treatment procedure is the frequency of large and small defects populating the surface of the cathode coating 70. The data provided in Table 2 was obtained using a laser inspection system. The two cathode coatings utilized in this expe(iment had Sicji ficantly different coating qualities. The cathode coatings were scanned uising the laser system before and after burnishing.
    [39] 39. The system scanned the cathode material surface and measured the frequency and size of coating defects. Signal processing was used to count the number of surface defects falling within two size categories, namely, large and small. TABLE 2 Roll A Roll A Roll E Roll E Small Large Small Large Defects Defects Defects Defects (Counts (Counts (Counts (Counts per per per per Decimeter) Decimeter) Decimeter) Decimeter) Before 3.8 1.0 7.2 3.9 Burnishing After 0.4 0.2 1.6 0.6 Burnishing
    [40] 40. The data provided in Table 2 indicates that burnishing the cathode coating in accordance with the principles of the present invention reduces the frequency of both large and small surface defects by a factor of approximately 4.5 to 9.5. Thle average defect frequencies, measured in terms of counts per decimeter, for the several cases are tabulated in Table 3 below. TABLE 3 Small Defect Large Defect Frequency Frequency (Counts per (Counts per Decimeter) Decimeter) Std. Std. Mean Dev. Max Mean Dev. MaxSample #1-Roll A 3.8 2.5 16.0 1.0 1.2 9.0 Before Burnishing Sample #2-Roll A 0.4 0.7 4.0 0.2 0.5 4.0 After Burnishing Sample #3-Roll E 7.2 6.3 46.0 3.9 3.9 29.0 Before Burnishing Sample #4-Roll E 1.6 2.4 24.0 0.6 1.0 8.0 After Burnishing
    [41] 41. Sections of the cathode coatings from Rolls A and E were removed and measured using a Wyko interferometer before and after burnishing. The interferometer produces three-dimensional images of 1 millimeter (mm) by 1 mm sections of the coating surface, and characterizes the z-direction dimension of surface features. One output of the interferometer is the Rt value, which represents the difference between a maximum and a minimum height observed in the sample as measured in microns. Another output of the instrument is the root mean square value of the roughness measured in microns, which is represented by the term Rq. Defects noticeable by the naked eye were analyzed. Areas with no defects were analyzed for purposes of comparison. Subgroup sizes of 6 to 12 samples were used.
    [42] 42. Tables 4 and 5 below provide interferometer data obtained using samples #1-#4 of the cathode material from each of Rolls A and E which were also subjected to laser system testing as is tabulated above in Table 3. TABLE 4 Areas including defects Defect Free (all units in microns) AreasRoll A Roll A Roll E Roll E Both RollsRt Rq Rt Rq Rt RqBefore 30.6 5.6 64.9 12.1 11.7 1.0 Burnishing After 15.5 2.1 28.5 4.0 9.9 0.9 Burnishing
    [43] 43. The data obtained from the defect free areas of the cathode coating indicates the magnitude of surface non-uniformity which impacts the values of Rt and Rq obtained from areas having defects. For example, the areas including defects for the Roll A cathode material produced an Rt value of 30.6 prior to burnishing. When considering the Rt value of 11.7 as an offset, the actual height of the defects detected on the Roll A sample is approximately 19 microns (i.e., 30.6-11.7 microns). The actual height of these defects after application of the burnishing treatment is reduced to approximately 6 microns (i.e., 15.5-9.9 microns). The actual height values for defects detected on the Roll E sample before and after application of the burnishing treatment are approximately 53 microns (i.e., 64.9-11.7 microns) and 19 microns (i.e., 28.5-9.9 microns), respectively. TABLE 5 Areas with Areas without Defects Defects (in microns) (in microns)Rq Ra Rt Rq Ra RtSample #1-Roll A Before Burnishing Mean 12.1 9.7 84.9 1.0 0.8 10.9 Std. dev. 6.1 5.5 21.4 0.0 0.0 1.4 Sample #2-Roll A After Burnishing Mean 4.0 3.2 28.5 1.0 0.8 8.8 Std. dev. 2.5 2.1 13. 0.1 0.1 1.0 Sample #3-Roll E Before Burnishing Mean 5.6 4.1 30.6 1.1 0.9 12.6 Std. dev. 3.1 3.0 10.0 0.1 0.1 3.0 Sample #4-Roll E After Burnishing Means 2.1 1.7 15.5 0.8 0.7 10.9 Std. dev. 1.0 1.0 7.2 0.1 0.1 2.3
    [44] 44. The data provided in Tables 4 and 5 demonstrates that burnishing reduced the height of surface defects in both sets of cathode coating samples. For example, the height, Rt, of surface defects for the cathode material developed on Rolls A and E were reduced by a factor of approximately 2, respectively. The root mean square data, Rq, indicates that the roughness of the coating surface was reduced by a factor of approximately 3 for the material coatings of Rolls A and E, respectively. Areas of the cathode material samples which were observed as being free of defects experienced little change in terms of observed height and roughness. It is noted that the term RA represents the roughness average which corresponds to the mean height over the sample.
    [45] 45. In general, experiments evaluating electrochemical cell performance using treated films of cathode material have revealed that a typical surface defect is hemispherical in shape, and can have a height of up to 50 microns. Depending on a particular application, the thickness of the solid electrolyte layer 78 may range between 1 to 100 microns.
    [46] 46. Electrolyte layers having a thickness of between 10 and 30 microns are typically employed. It has been determined that reducing the size of defects on the cathode surface results in a proportional reduction in incidences of electrical shorting and cell voltage instabilities.
    [47] 47. It is noted that a known calendering process is often used when a densified elecLrode/cathode is desired. Although calendering tends Lo reduce the size of larger surface defects, it has been observed that increasing calendering pressures within a reasonable range of operation does not sufficiently reduce the size and frequency of surface defects on tule cathode coated film. It is also noted that increasig lamination pressures within a reasonable range of operation are insufficient to reduce the size of surface defects and the resultant tenting effect. Treating the cathode material in a manner consistent with the principles of the present invention, however, may obviate the need to perform a calendering procedure, and may also provide an opportunity to reduce lamination pressures.
    [48] 48. Treating the entire, surface of the cathode material provides for improved surface uniformity and reduced dendrite growth. Althought a first treatment may sufficiently remove large surface defects, it may be desirable to further treat the cathode material surface in order to achieve increased surface smoothness.
    [49] 49. It has been observed that voltage fluctuations and voltage drops within electrochemical cells developed using thin cathode coated films are typically associated with the presence of local defects formed or otherwise disposed on the surface of the cathode coating. Various catastrophic failure modes, such as electrical shorts, are also associated with these surface defects. The data provided in Table 6 demonstrates that a burnishing procedure in accordance with the principles of the present invention provides for the production of electrochemical cells having stable initial voltages, indicating a reduction in the size and number of surface defects. TABLE 6 Burnishing Employed Initial Sample Voltage (Volts) 1 3.590 2 3.588 3 3.589 4 3.588 5 3.589 6 3.590 7 3.589 8 3.590 9 3.589 10 3.589 11 3.587 12 3.586 13 3.586 14 3.587 15 3.586
    [50] 50. The data provided in Table 7, in contrast to that of Table 6, demonstrates that a high degree of voltage instability typically occurs within a population of electrochemical cells in which the cathode coated films used to produce such cells are not subjected to the burnishing or lapping procedure. The data of Table 6 was obtained using 15 thin-film lithium polymer electrochemical cells having a cylindrical configuration. TABLE 7 Burnishing Not Employed Initial Sample Voltage (Volts) 1 3.549 2 3.390 3 3.571 4 3.423 5 3.454
    [51] 51. The initial voltages of electrochemical cells constructed from cathode coated thin-films which were subjected to burnishing ranged between 3.590 V and 3.586 V. This variation in cell voltage corresponds to a voltage instability on the order of 0.1%. The data provided in Table 7 was obtained using five lithium polymer electrochemical cells having a cylindrical cross-section.
    [52] 52. It can be seen that fabricating electrochemical cells using non-burnished cathode films results in cells that experience significantly greater voltage variations. For example, the initial voltage values provided in Table 7 indicate cell voltage instability on the order of 5%, which is significantly larger than the 0.1% voltage fluctuation observed in cells having burnished cathode film layers.
    [53] 53. An embodiment of an apparatus for treating a cathode material provided on a surface of a continuous thin-film substrate is illustrated in FIG. 5. In accordance with this embodiment, a coated cathode laminate 85 is shown being unwound from a feed roll 86. It is understood that the cathode laminate, comprising a cathode coating on a continuous substrate, is untreated within the context of the present invention when it is initially unwound from the feed roll 86. The cathode laminate 85 is transferred to a treatment station 80 where it is treated by an abrasive material 82. The cathode laminate 85 a may then pass through a second, optional treatment station 90 where it is further treated by use of an abrasive material 84. The treated coated cathode laminate 85 b is directed to take-up roll 88.
    [54] 54. In one embodiment, the abrasive material 82, 84 whlich is used to treat the coated cathode laminate 85 constitutes moving webs of abrasive material, such as lapping films or burnishing films. The lapping or burnishing films 82, 84 employed at treatment stations 80, 90 move in a direction generally opposite to that of the cathode laminate web 85. It is noted that the burnishing or lapping technique typically removes smialler defects, while larger defects are truncated.
    [55] 55. The films utilized for the burnishing or lapping operations at treatment stations 80, 90 are typically conventional lapping or burnishing films. In one embodiment, 10 micron or less lapping films are used. In this context, the term “10 micron or less” represents the average size or grade of the abrasive particles on the lapping film. Typically, 9 micron or smaller lapping films are used.
    [56] 56. In some applications, in which two abrasive treatments are conducted, it may be desirable to use different sizes or grades of lapping films. For example, a 5 to 10 micron lapping film may be used for an initial abrasion treatment at treatment station 80, with a follow-up treatment using a 2 micron lapping film at treatment station 90. A lapping film suitable for this application is 3M 461X manufactured by Minnesota Mining and Manufacturing Company. Other suitable lapping films may be fabricated from aluminum oxide, silicon carbide, or chrome oxide materials, for example.
    [57] 57. Turning now to FIG. 6, there is illustrated a more detailed embodiment of an apparatus for treating a thin-film substrate having a cathlode material provided thereon through use of an abrasive material. In accordance with this embodiment, a web 101 of cathode material is transported through the treatment station 100 so that the web 101 contacts a treatmtlenat roller 102. Depending on the orientation of idlers 103, 105, a contact angle α. may be varied to increase or decrease the amount of product roller surface area that comes into contact with the product web 101. In one embodiment, the contact angle a represents an angle of approximately 80°. In accordance with another embodiment, the contact angle may be varied between an angle less than 80° and up to an angle of approximately 160° by appropriate placement of the idlers 103, 105.
    [58] 58. A lapping or burnishing film 106 passes over the treatment roller 102 and is driven at a rate, RAbrasive, by a drive roller 104. The drive roller 104 is typically fabricated from rubber, and the treatment roller 102 is typically constructed from steel or other metallic material. The product web 101 contacts the abrasive film 106 along the surface of the treatment roller 102 defined by the contact angle α. Idlers 103, 105, in addition to other components, force the product web 101 against the treatment roller 102 and hence the abrasive film 106.
    [59] 59. Several important parameters that impact the efficacy of the cathode material treatment procedure include the tension in the product web 101 and in the abrasive film 106, the contact angle α, the rate, RProduct, of the product web 101 passing through the treatment station 100, the force, F, produced to maintain contact between tihe product web 101 and the abrasive film 106, and the length of time during which the product web 101 is in contact with the treatment roller 102.
    [60] 60. In one embodiment, the product web 101 passes over the treatment roller 102 at a rate of approximately 10 meters per minute (m/m). The abrasive film 106 moves at a rate of approximately 0.3 m/m and in a direction opposite to that of the product web 101. In this embodimentt, the tension in the product Web 101 is held to approximately 5 kg for a product web having a width of 150 mm. The tension in the abrasive film 106 is approximately 5 kg for an abrasive film having a width of approximately 150 mm. It is noted that the data provided in Tables 2-7 was obtained using the above-described film tensions and rates using 9 micron lapping film for two process passes.
    [61] 61. It is noted that the speed of the product web 101 and that of the abrasive film 106 may be varied from the values specified above. By way of example, the First Treatment data provided in Table 1 above was obtained from a product web 101 which was treated at a speed of approximately 11 m/m using 5 micron lapping film moving at a speed of approximately 1 m/m. By way of further example, the Second Treatment data of Table 1 was obtained from a product web 101 moving at a speed of approximately 11 m/m which was treated at a first treatment station using 5 micron lapping film moving at a speed of approximately 1 m/m, and subsequently treated with 2 micron lapping film moving at a speed of approximately 0.9 m/m at a second treatment station.
    [62] 62. In an embodiment in which cathode material is deposited on both sides of a thin-film substrate, such as in a bi-face configured electrochemical cell, a first side may be processed for the entire product roll, and then repeated for the opposite side of the product roll. In another embodiment, two treatment stations may be situated on either sides of the product web 101 to treat both sides of the product web 101 in a single pass.
    [63] 63. Typically, a sufficient degree of burnishing may be accomplished using a 9 or 10 micron burnishing or lapping film 106 in a single plass of LiIe product web 101. Visual inspection of the treated product web 101 may reveal that additional treatment may be required.
    [64] 64. In such cases, a second or third pass may be necessary using a more aggressive abrasive, such as 30 or 60 micron lapping or burnishing films.
    [65] 65. In accordance with another embodiment, and as illustrated in FIG. 7, a cathode material product web 111 is passed through a treatment station 110 which includes a product roller 112 which forces the product web 111 against an abrasion roller 116. The speed of the abrasion roller 116, the force exerted on the product web 111 by the abrasion and product rollers 116, 112, the rate of the product web 111 through the treatment station 110, and the type of abrasive used may be varied to burnish the cathode material to a sufficient degree as described hereinabove. It is noted that occasional cleansing of the abrasion roller 116 is typically required. In one embodiment, the abrasion roller 116 may be rotated at a surface rate of 10 m/mn and the product web may be moved at a rate of 1 m/m.
    [66] 66. Although the advantages of the present invention have been described hereinabove specifically with respect to cathode oxide materials deposited on thin-film substrates, the general burnishing process has been demonstrated to be efficacious on other cathode material structures. As such, the present invention is not restricted to use only with oxide materials deposited on a continuous thin-fium substrate.
    [67] 67. By way of further example, the principles of the present invention may be applied in the processing of lithium foil or films during a cleansing procedure. In particular, lithium films which are fabricated for use in thin-film lithium polymer batteries typically have a passivation layer. The burnishing technique described herein may be used to cleanse a lithium anode foil and to reduce surface roughness of lithium anode foil. In particular, the burnishing technique disclosed herein may be used to remove the passivation layer prior to electrochemical cell assembly. A reduction in surface roughness to on the order of 1 to 2 microns of smoothness, for example, improves attachment of the lithium anode foil to the solid electrolyte and can reduce the rate of dendrite formation.
    [68] 68. The foregoing description of the various embodiments of the invention has been presented for the purposes of illustration and description. It is not intended to be exhaustive or to limit the invention to the precise form disclosed. Many modifications and variations are possible in light of the above teaching. For example, burnishing a product web or foil may be accomplished by moving an abrasive material in a cross-web direction or a direction other than opposite to that of the product web or foil as it passes through a treatment station. It is intended that the scope of the invention be limited not by this detailed description, but rather by the claims appended hereto.
    权利要求:
    Claims (34)
    [1" id="US-20010001053-A1-CLM-00001] 1. A method of treating a cathode material provided on a surface of a thin-film substrate, comprising:
    moving the thin-film substrate between a feed mechanism and a take-up mechanism, some of the cathode material including defects protruding from a surface of the cathode material; and
    treating the cathode material surface at a treatment station with an abrasive material to reduce a height of the defects so as to increase an 85 degree gloss value of the cathode material surface by at least approximately 10.
    [2" id="US-20010001053-A1-CLM-00002] 2. The method of
    claim 1 , wherein treating the cathode material stirface further comprises moving a film of the abrasive material against the cathode material surface.
    [3" id="US-20010001053-A1-CLM-00003] 3. The method of
    claim 2 , wherein the film of the abrasive material comprises abrasive particles ranging in size between approximately 2 to 60 microns.
    [4" id="US-20010001053-A1-CLM-00004] 4. The method of
    claim 2 , wherein moving the film of the abrasive material furtherl comprises moving the film of the abrasive material in a direction substantially opposite to a direction in which the thin-film substrate passes through the treatment station.
    [5" id="US-20010001053-A1-CLM-00005] 5. The method of
    claim 1 , wherein treating the cathode material surface further comprises moving a roller provided with the abrasive material against the cathode material surface.
    [6" id="US-20010001053-A1-CLM-00006] 6. The method of
    claim 5 , wherein moving the roller provided with the abrasive material further comprises moving the roller of the abrasive material in a direction substantially opposite to a direction in which the thin-film substrate passes through the treatment station.
    [7" id="US-20010001053-A1-CLM-00007] 7. The method of
    claim 1 , wherein treating the cathode material surface further comprises:
    treating the cathode material surface at a first treatment station with a first abrasive material of a first grade; and
    treating the cathode material surface at a second treatment station with a seconid abrasive material of at second grade.
    [8" id="US-20010001053-A1-CLM-00008] 8. The method of
    claim 1 , wherein treating the cathode material surface further comprises:
    treating a surface of the cathode material provided on a first side of the thin-film substrate at a first treatment station; and
    treating a surface of the cathode material provided on a second side of the thin-film substrate at a second treatment station.
    [9" id="US-20010001053-A1-CLM-00009] 9. The method of
    claim 8 , wherein treating the cathode material surfaces further comprises contemporaneously treating the cathode material surfaces provided on the first and second sides of the thin-film substrate, respectively.
    [10" id="US-20010001053-A1-CLM-00010] 10. The method of
    claim 8 , wherein treating the cathode material surfaces further comprises treating the cathode material surfaces respectively provided on the first and second sides of the thin-film substrate in succession.
    [11" id="US-20010001053-A1-CLM-00011] 11. The method of
    claim 8 , wherein treating the cathode material surface further comprises treating the cathode material surface with the abrasive material to reduce the height of the defects to a height of approximately 10 microns or less.
    [12" id="US-20010001053-A1-CLM-00012] 12. The method of
    claim 1 , wherein treating the cathode material surface further comprises treating the cathode material surface with the abrasive material to reduce the height of the defects to a height which is less than a thickness of an electrolyte layer to be provided on the cathode material surface.
    [13" id="US-20010001053-A1-CLM-00013] 13. An apparatus for treating a cathode material provided on a surface of a thin-film substrate, comprising:
    a feed mechanism and a take-up mechanism that cooperatively operate to move the thin-film substrate, some of the cathode material including defects protruding from a surface of the cathode material; and
    a treatment station for treating the cathode material surface with an abrasive material to reduce a height of the defects so as to increase an 85 degree gloss value of the cathode material surface by at least approximately 10.
    [14" id="US-20010001053-A1-CLM-00014] 14. The apparatus of
    claim 13 , wherein the treatment station further comprises:
    a first roller over which the thin-film substrate passes; and
    a second roller which drives a film of the abrasive material against the cathode material surface.
    [15" id="US-20010001053-A1-CLM-00015] 15. The apparatus of
    claim 14 , wherein the thin-film substrate passes over a surface of the first roller having an arc length which varies as a function of a contact angle α, the contact angle α varying between approximately 80 and 160 degrees.
    [16" id="US-20010001053-A1-CLM-00016] 16. The apparatus of
    claim 13 , wherein the treatment station further comprises:
    a first roller over which the thin-film substrate passes; and
    a second roller which drives a film of the abrasive material over the first roller and against the cathode material surface.
    [17" id="US-20010001053-A1-CLM-00017] 17. The apparatus of
    claim 13 , wherein the treatment station further comprises:
    a first roller over which the thin-film substrate passes; and
    a second roller provided with the abrasive material which contacts the cathode material surface.
    [18" id="US-20010001053-A1-CLM-00018] 18. The apparatus of
    claim 13 , wherein the treatment station further comprises:
    a first treatment station for treating the cathode material surface with a first abrasive material of a first grade; and
    a second treatment station for treating the cathode material surface with a second abrasive material of a second grade.
    [19" id="US-20010001053-A1-CLM-00019] 19. The method of
    claim 13 , wherein the treatment station further comprises:
    a first treatment station for treating a surface of the cathode material provided on a first side of the thin-film substrate; and
    a second treatment station for treating a surface of the cathode material provided on a second side of the thin-film substrate.
    [20" id="US-20010001053-A1-CLM-00020] 20. A thin-film cathode prepared by a process comprising:
    providing a thin-film substrate having a coating of cathode material disposed thereon, some of the cathode material including defects protruding from a surface of the cathode material;
    moving the thin-film substrate between a feed mechanism and a take-up mechanism; and
    treating the cathode material surface at a treatment station with an abrasive material to reduce a height of the defects so as to increase an 85 degree gloss value of the cathode material surface by at least approximately 10.
    [21" id="US-20010001053-A1-CLM-00021] 21. The cathode of
    claim 20 , wherein treating the cathode material surface further comprises moving a film of the abrasive material in a direction substantially opposite to a direction in which the thin-film substrate passes through the treatment station.
    [22" id="US-20010001053-A1-CLM-00022] 22. The cathode of
    claim 21 , wherein the film of the abrasive material comprises abrasive particles ranging in size between approximately 2 to 60 microns.
    [23" id="US-20010001053-A1-CLM-00023] 23. The cathode of
    claim 20 , wherein treating the cathode material surface further comprises moving a roller provided with the abrasive material against the cathode material surface, the roller moving in a direction substantially opposite to a direction in which the thin-film substrate passes through the treatment station.
    [24" id="US-20010001053-A1-CLM-00024] 24. The cathode of
    claim 20 , wherein treating the cathode material surface further comprises:
    treating the cathode material surface at a first treatment station with a first abrasive material of a first grade; and
    treating the cathode material surface at a second treatment station with a second abrasive material of a second grade.
    [25" id="US-20010001053-A1-CLM-00025] 25. The cathode.of
    claim 20 , wherein treating the cathode material surface further comprises:
    treating a surface of the cathode material provided on a first side of the thin-film substrate at a first treatment station; and
    treating a surface of the cathode material provided on a second side of the thin-film substrate at a second treatment station.
    [26" id="US-20010001053-A1-CLM-00026] 26. The cathode of
    claim 20 , wherein the height of the defects protruding from the cathode material surface is reduced in height to a ight no greater than approximately 10 microns.
    [27" id="US-20010001053-A1-CLM-00027] 27. The cathode of
    claim 20 , wherein the height of the defects protruding from the cathode material surface is reduced to a height which is less than a thickness of an electrolyte layer to be provided on the cathode material surface.
    [28" id="US-20010001053-A1-CLM-00028] 28. A method of treating a cathode material provided on a surface of a thin-film substrate, comprising:
    moving the thin-film substrate between a feed mechanism and a take-up mechanism, some of the cathode material including defects protruding from a surface of the cathode material; and
    treating the cathode material surface at a treatment station with an abrasive material to reduce a height of the defects to a height which is less than a thickness of an electrolyte layer to be provided on the cathode material surface.
    [29" id="US-20010001053-A1-CLM-00029] 29. The method of
    claim 28 , wherein treating the cathode material further comprises treating the cathode material surface with the abrasive material to reduce the height of the defects to a height which is less than the electrolyte layer having a thickness of between 1 and 100 microns.
    [30" id="US-20010001053-A1-CLM-00030] 30. A method of treating a lithium anode foil, comprising:
    moving the lithium anode foil between a feed mechanism and a take-up mechanism, the anode foil including a passivation layer developed on a surface of the anode foil; and
    treating the anode foil surface at a treatment station with a film of abrasive material to cleanse and reduce a roughness of the anode foil surface.
    [31" id="US-20010001053-A1-CLM-00031] 31. The method of
    claim 30 , wherein the film of the abrasive material comprises abrasive particles ranging in size between approximately 2 to 60 microns.
    [32" id="US-20010001053-A1-CLM-00032] 32. The method of
    claim 30 , wherein treating the anode foil surface further comprises moving the film of abrasive material in a direction substantially opposite to a direction in which the anode foil passes through the treatment station.
    [33" id="US-20010001053-A1-CLM-00033] 33. The method of
    claim 30 , wherein treating the anode foil surface further comprises:
    treating the anode foil surface at a first treatment station with a first abrasive material of a first grade; and
    treating the anode foil surface at a second treatment station with a second abrasive material of a second grade.
    [34" id="US-20010001053-A1-CLM-00034] 34. TIhe method of
    claim 30 , wherein treating the anode foil surface further comprises reducing a roughness of the anode foil surface to approximately 1 to 2 microns of smoothness.
    类似技术:
    公开号 | 公开日 | 专利标题
    US6517591B2|2003-02-11|Apparatus and method for treating a cathode material provided on a thin-film substrate
    US6761744B1|2004-07-13|Lithium thin film lamination technology on electrode to increase battery capacity
    KR101201050B1|2012-11-14|Method for producing electrode plate for battery
    US9490476B2|2016-11-08|Nonaqueous electrolyte secondary battery and manufacturing method thereof
    JP2005183181A|2005-07-07|Electrode plate for nonaqueous electrolyte secondary battery and manufacturing method of the same
    US10903672B2|2021-01-26|Charge method for solid-state lithium-based thin-film battery
    JP2018063776A|2018-04-19|Electrode manufacturing device
    KR100646550B1|2006-11-14|Electrode plate of secondary battery and coating apparatus for the same
    JP4577541B2|2010-11-10|Separator electrode manufacturing method, battery manufacturing method, and separator / electrode stacking apparatus
    JP4957167B2|2012-06-20|Current collector, electrode plate for non-aqueous electrolyte secondary battery, and method for producing non-aqueous electrolyte secondary battery using the same
    JP5076305B2|2012-11-21|Method for producing negative electrode for lithium secondary battery and method for producing lithium secondary battery
    US20170069904A1|2017-03-09|Separator for battery, secondary battery including the same, and method of manufacturing separator for battery
    KR101850645B1|2018-05-31|Aluminum foil for cathode current collector in lithium ion battery, method of manufacturing the same, lithium ion battery having the same
    EP3748044A1|2020-12-09|Electrolytic copper foil having high-temperature dimensional stability and texture stability, and manufacturing method therefor
    KR101156871B1|2012-06-20|Electrode collector manufacturing method and manufacturing apparatus, and battery provided with said collector
    EP3598555A1|2020-01-22|Electrode, electrode assembly, and manufacturing method therefor
    KR102264657B1|2021-06-15|Pressing Apparatus for Electrode Sheet Having Guide Roller
    JP4899793B2|2012-03-21|Vacuum deposition equipment
    US20170256780A1|2017-09-07|Method of manufacturing lithium-ion secondary battery electrode sheet
    US10978767B2|2021-04-13|Method for producing nonaqueous electrolyte secondary battery separator
    KR20220007937A|2022-01-20|Electrode rolling apparatus and method using induction heating process before and after rolling process
    KR20070097148A|2007-10-04|Rechargeable battery having jelly roll type electrode assembly
    US11081731B2|2021-08-03|High-capacity rechargeable batteries
    KR20220007934A|2022-01-20|Electrode rolling apparatus and method for performing multi-stage induction heating
    WO2020170543A1|2020-08-27|Non-aqueous electrolyte secondary battery, and method for manufacturing positive electrode plate used therein
    同族专利:
    公开号 | 公开日
    EP1038328A1|2000-09-27|
    US6517591B2|2003-02-11|
    AU8585698A|1999-07-05|
    US6235425B1|2001-05-22|
    JP2002509341A|2002-03-26|
    WO1999031744A1|1999-06-24|
    JP4959050B2|2012-06-20|
    CA2325367A1|1999-06-24|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    US20080013985A1|2006-04-04|2008-01-17|Bridgestone Corporation|Developing roller and method of producing the same, and inspection process for developing roller product|
    US7473491B1|2003-09-15|2009-01-06|Quallion Llc|Electrolyte for electrochemical cell|
    US20090029254A1|2002-01-08|2009-01-29|Sony Corporation|Cathode active material and non-aqueous electrolyte secondary battery using the same|
    US20110052972A1|2009-09-02|2011-03-03|Samsung Sdi Co., Ltd|Electrode plate, electrode assembly and manufacturing method of electrode plate|
    CN102224620A|2009-01-07|2011-10-19|松下电器产业株式会社|Method for manufacturing electrochemical element electrode, electrochemical element electrode, and electrochemical element|
    US20190081284A1|2017-09-14|2019-03-14|Sumitomo Chemical Company, Limited|Electrode assembly and nonaqueous electrolyte secondary battery|US2899635A|1952-03-07|1959-08-11||Electric battery with charge testing means |
    US3390014A|1960-05-11|1968-06-25|Eisler Paul|Secondary electric batteries having plurality of thin flexible intermediate bipolar plates|
    US3193412A|1962-02-20|1965-07-06|Electric Storage Battery Co|Electric battery|
    FR1586636A|1968-02-29|1970-02-27|||
    US3630783A|1970-05-11|1971-12-28|Mallory Battery Canada|Heat-shrinkable packaging for batteries|
    JPS5218891B1|1971-03-19|1977-05-25|||
    FR2193242B1|1972-07-13|1977-05-13|Siemens Ag||
    FI49090C|1972-11-10|1975-03-10|Pentti Juuse Tamminen|Galvanic stacking battery.|
    US3793501A|1972-12-04|1974-02-19|Ici America Inc|Explosive switch|
    US3899355A|1974-02-14|1975-08-12|Polaroid Corp|Battery assembly|
    US4152825A|1974-06-10|1979-05-08|Polaroid Corporation|Method of making a flat battery|
    US4105815A|1974-08-08|1978-08-08|Polaroid Corporation|Flat battery with electrodes in slurry form|
    US4028479A|1974-12-26|1977-06-07|Polaroid Corporation|Flat battery|
    US3937635A|1975-01-09|1976-02-10|Wilson Greatbatch|Lithium-iodine battery|
    US4105807A|1975-07-28|1978-08-08|Unican Electrochemical Products Ltd.|Production of thin, stable, solid electrolyte films of high ionic conductivity|
    US4060669A|1975-09-10|1977-11-29|Polaroid Corporation|Flat battery|
    ES450123A1|1976-07-24|1977-12-16|Celaya Emparaza Y Galdos S A|Electric batteries|
    US4098965A|1977-01-24|1978-07-04|Polaroid Corporation|Flat batteries and method of making the same|
    US4150266A|1977-01-27|1979-04-17|Networks Electronic Corp.|Miniature pyrotechnic squib switch, single pole, normally open|
    US4091186A|1977-11-07|1978-05-23|Esb Incorporated|Dry cell battery having electrical spring contact adhered to terminal|
    US4209479A|1977-11-25|1980-06-24|P. R. Mallory & Co. Inc.|Means for improving manufacture of solid state cells|
    US4207389A|1977-11-25|1980-06-10|P. R. Mallory & Co. Inc.|Solid state cells|
    US4303877A|1978-05-05|1981-12-01|Brown, Boveri & Cie Aktiengesellschaft|Circuit for protecting storage cells|
    US4322484A|1978-09-05|1982-03-30|General Electric Company|Spiral wound electrochemical cell having high capacity|
    NL7809298A|1978-09-13|1980-03-17|Electrochem Energieconversie|METHOD FOR MANUFACTURING AN ELECTROCHEMICAL CELL OR BATTERY.|
    DE2849326C2|1978-11-14|1989-03-16|Deutsche Automobilgesellschaft Mbh, 3000 Hannover, De||
    US4238721A|1979-02-06|1980-12-09|The United States Of America As Represented By The United States Department Of Energy|System and method for charging electrochemical cells in series|
    US4342978A|1979-03-19|1982-08-03|S&C Electric Company|Explosively-actuated switch and current limiting, high voltage fuse using same|
    DE3011643A1|1980-03-26|1981-10-01|Metallgesellschaft Ag, 6000 Frankfurt|ELECTROLYSIS CELL|
    US4383013A|1980-07-23|1983-05-10|Chloride Silent Power Limited|High temperature multicell electrochemical storage batteries|
    US4490707A|1980-08-18|1984-12-25|S&C Electric Company|Explosively-actuated, multi-gap high voltage switch|
    JPS5743526A|1980-08-27|1982-03-11|Seiko Instr & Electronics|Charge control circuit|
    US4370531A|1980-09-19|1983-01-25|S&C Electric Company|Electric switch and improved device using same|
    FI65688C|1981-04-27|1984-06-11|Sporax Oy|CONTACT CONTROL FOR BATTERIES I ETT GALVANISKT BATTERI|
    FR2511547B1|1981-08-13|1985-08-09|Moli Energy Ltd|METHOD FOR INCREASING THE REVERSIBILITY OF AN ELECTRIC BATTERY, ELECTRODE DEVICE FOR CARRYING OUT SAID METHOD AND BATTERY THUS OBTAINED|
    US4664993A|1981-08-24|1987-05-12|Polaroid Corporation|Laminar batteries and methods of making the same|
    US4436792A|1981-11-12|1984-03-13|Nippon Kogaku K.K.|Container device for planar battery|
    US4429026A|1982-01-20|1984-01-31|Polaroid Corporation|Laminar multicell lithium batteries|
    SU1066385A1|1982-06-11|1986-06-15|Предприятие П/Я А-7904|Liquid-metal switching device|
    CA1173900A|1982-06-30|1984-09-04|Andre Belanger|Composite and flexible anodes for non aqueous lithiumcells|
    US4571468A|1982-07-16|1986-02-18|University Of Texas System|Inductive store opening switch|
    US4479083B1|1982-09-30|1998-09-01|Vanner Weldon Inc|DC power system having battery voltage equalizer circuit|
    JPS5973864A|1982-10-20|1984-04-26|Showa Denko Kk|Layer-built sheet-like polymer secondary battery|
    DE3246968C2|1982-12-18|1986-03-20|Varta Batterie Ag, 3000 Hannover|Electric battery with several cells lying next to one another and arranged parallel to one another|
    JPH06101329B2|1982-12-23|1994-12-12|松下電器産業株式会社|Battery plate buffing machine|
    US4923582A|1982-12-27|1990-05-08|Eltech Systems Corporation|Monopolar, bipolar and/or hybrid memberane cell|
    US4495259A|1983-02-11|1985-01-22|The Gates Rubber Company|Vibration resistant battery|
    US4758483A|1983-03-11|1988-07-19|Societe Nationale Elf Aquitaine|Novel macromolecular material for use in realizing electrolytes and/or electrodes|
    US4707795A|1983-03-14|1987-11-17|Alber Engineering, Inc.|Battery testing and monitoring system|
    US4507857A|1983-06-22|1985-04-02|Battery Engineering Inc.|Electrochemical cell|
    US4477545A|1983-06-29|1984-10-16|Union Carbide Corporation|Isostatic compression method for producing solid state electrochemical cells|
    US4654278A|1983-09-29|1987-03-31|The United States Of America As Represented By The Secretary Of The Navy|Thermal cell non-deflagration design|
    US4525439A|1983-10-07|1985-06-25|Simonton Robert D|Connector aperture seal for a galvanic cell|
    DE3426199C2|1984-07-17|1994-02-03|Asea Brown Boveri|Bridging element|
    JPH0419674B2|1984-10-25|1992-03-31|Meidensha Electric Mfg Co Ltd||
    US4547438A|1984-12-18|1985-10-15|Duracell Inc.|Battery assembly|
    US4670703A|1985-05-06|1987-06-02|General Electric Company|Battery charger with three different charging rates|
    US4692577A|1985-10-25|1987-09-08|S&C Electric Company|Switch for a high-voltage interrupting module|
    US4713597A|1985-12-04|1987-12-15|Powerplex Technologies, Inc.|Silicon diode looping element for protecting a battery cell|
    US4691085A|1985-12-19|1987-09-01|S&C Electric Company|High voltage interrupting switch with improved contact connection arrangement and method|
    IL78893A|1986-05-23|1991-08-16|Univ Ramot|Electrochemical battery packaging|
    FR2606216A1|1986-10-30|1988-05-06|Elf Aquitaine|ION CONDUCTION MATERIAL|
    CA1288473C|1987-03-11|1991-09-03|Andre Belanger|Thin electrode carried on electronically conducting strip, and process for itsmanufacture|
    US4828939A|1987-06-01|1989-05-09|Eltech Systems Corporation|Bipolar metal/air battery|
    US4927717A|1987-06-01|1990-05-22|Eltech Systems Corporation|Bipolar metal/air battery|
    US4752540A|1987-06-05|1988-06-21|Honeywell Inc.|Polymeric enclosures for non-aqueous active metal cells|
    FR2616971A1|1987-06-18|1988-12-23|Elf Aquitaine|INTERMEDIATE ASSEMBLY FOR THE PRODUCTION IN THE FORM OF THIN FILMS OF A LITHIUM BATTERY, METHOD OF MAKING SAME, AND METHOD FOR PRODUCING THE ACCUMULATOR|
    GB8715708D0|1987-07-03|1987-08-12|Chloride Silent Power Ltd|Batteries|
    US4852684A|1987-12-16|1989-08-01|Minnesota Mining And Manufacturing Company|Compressible ear tip|
    US4913259A|1987-12-16|1990-04-03|Minnesota Mining And Manufacturing Company|Compressible ear tip|
    US4911993A|1988-02-01|1990-03-27|Eltech Systems Corporation|Bipolar, filter-press, consumable metal anode battery|
    US4887348A|1988-03-09|1989-12-19|Tamminen Pentti J|Alkalline cell battery and method for manufacture thereof|
    US4816354A|1988-03-09|1989-03-28|Tamminen Pentti J|Alkaline cell battery and method for manufacture thereof|
    US4961043A|1988-03-15|1990-10-02|Norand Corporation|Battery conditioning system having communication with battery parameter memory means in conjunction with battery conditioning|
    JPH01320758A|1988-06-22|1989-12-26|Tosoh Corp|Battery|
    US5070787A|1988-06-24|1991-12-10|The Board Of Regents Of The University Of Texas System|Method and apparatus for switching an electrical circuit|
    SE467165B|1988-10-28|1992-06-01|Nike Ab|PRESSURE AIR PUMP DEVICE|
    US5008161A|1989-02-01|1991-04-16|Johnston Lowell E|Battery assembly|
    US4997732A|1989-03-30|1991-03-05|Mhb Joint Venture|Battery in a vacuum sealed enveloping material and a process for making the same|
    US4973936A|1989-04-27|1990-11-27|The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Adminstration|Thermal switch disc for short circuit protection of batteries|
    US4967136A|1989-09-25|1990-10-30|Prestolite Electric Incorporated|Battery equalization circuit for a dual voltage charging system|
    CA2038354A1|1990-03-30|1991-10-01|William H. Kelly|Ni-h2 battery having improved thermal properties|
    GB2244368A|1990-05-16|1991-11-27|Chloride Silent Power Ltd|A thermal shunt for a battery contained in a thermally-insulated container|
    GB2248139A|1990-08-07|1992-03-25|Chloride Silent Power Ltd|High temperature battery terminal provided with heat dissipator to prevent damage to cable insulation|
    US5188869A|1990-08-14|1993-02-23|Eveready Battery Company, Inc.|Process for burnishing anode current collectors|
    US5066370A|1990-09-07|1991-11-19|International Business Machines Corporation|Apparatus, electrochemical process, and electrolyte for microfinishing stainless steel print bands|
    US5089027A|1990-11-26|1992-02-18|Gould Inc.|Method for producing a solid electrolyte cell|
    US5071652A|1990-12-11|1991-12-10|Globe-Union Inc.|Metal oxide hydrogen battery having improved heat transfer properties|
    US5057385A|1990-12-14|1991-10-15|Hope Henry F|Battery packaging construction|
    US5227264A|1991-02-14|1993-07-13|Hydro-Quebec|Device for packaging a lithium battery|
    US5547775A|1991-04-26|1996-08-20|Sony Corporation|Circuit for preventing overcharge and overdischarge of secondary batteries|
    US5180641A|1991-05-09|1993-01-19|Rockwell International Corporation|Battery cell bypass circuit|
    US5227259A|1991-07-24|1993-07-13|Electric Power Research Institute, Inc.|Apparatus and method for locating and isolating failed cells in a battery|
    CA2051611C|1991-09-17|1996-01-23|Michel Gauthier|Process for preparation of electrode collector systems for thin film generators, electrode collector systems et generators therefrom|
    US5199239A|1991-09-30|1993-04-06|Honeywell Inc.|Housing seal interface|
    US5162171A|1991-10-28|1992-11-10|Globe-Union Inc.|Metal oxide-hydrogen battery having modules extending longitudinally of the pressure vessel|
    CA2100678A1|1991-12-06|1993-06-07|Hiroshi Kagawa|Film type battery and layer-built film type battery|
    DE4142628C1|1991-12-21|1993-05-06|Dieter Braun||
    US5197889A|1992-02-03|1993-03-30|Motorola, Inc.|Electrical contact for battery package or similar device|
    US5283512A|1992-04-13|1994-02-01|Hughes Aircraft Company|Charge balancing of batteries during charging|
    CA2068290C|1992-05-08|1999-07-13|Michel Gauthier|Electrical connecting on lithium anodes|
    US5204194A|1992-05-21|1993-04-20|Magnavox Electronic Systems Company|Multicell battery having a tab-fuse for overcurrent interruption|
    DE4218381C1|1992-06-04|1993-05-13|Daimler-Benz Aktiengesellschaft, 7000 Stuttgart, De||
    US5313152A|1992-06-19|1994-05-17|Ford Motor Company|Network for minimizing current imbalances in a faradaic battery|
    US5453174A|1992-07-16|1995-09-26|Electroplating Technologies Ltd.|Method and apparatus for depositing hard chrome coatings by brush plating|
    US5385793A|1992-07-20|1995-01-31|Globe-Union Inc.|Thermal management of battery systems|
    DE4225746A1|1992-08-04|1994-02-10|Hagen Batterie Ag|Circuit device|
    US5300373A|1992-09-11|1994-04-05|Valence Technology, Inc.|Electrochemical cell stack and method of making an electrochemical cell stack|
    US5530336A|1992-09-17|1996-06-25|Sony Corporation|Battery protection circuit|
    US5337042A|1992-09-28|1994-08-09|Chrysler Corporation|Vehicle communications network transceiver, transmitter circuit therefor|
    US5478667A|1992-10-29|1995-12-26|Shackle; Dale R.|Heat dissipating current collector for a battery|
    US5363405A|1992-11-27|1994-11-08|Chrysler Corporation|Vehicle communications network transceiver, bus driver therefor|
    US5354630A|1992-12-10|1994-10-11|Comsat|Ni-H2 battery having improved thermal properties|
    JP3397351B2|1992-12-18|2003-04-14|キヤノン株式会社|Prismatic or sheet type battery and manufacturing method thereof|
    US5547780A|1993-01-18|1996-08-20|Yuasa Corporation|Battery precursor and a battery|
    US5409787A|1993-02-17|1995-04-25|Electrosource, Inc.|Battery plate compression cage assembly|
    JP3592712B2|1993-04-05|2004-11-24|ブラックアンドデッカーインコーポレイティド|Battery pack for cordless device|
    JP3384027B2|1993-05-14|2003-03-10|ソニー株式会社|Charging method and charger|
    US5622612A|1993-06-02|1997-04-22|Duracell Inc.|Method of preparing current collectors for electrochemical cells|
    US5438249A|1993-06-08|1995-08-01|Valence Technology, Inc.|Method of state-of-charge indication by measuring the thickness of a battery|
    US5479083A|1993-06-21|1995-12-26|Ast Research, Inc.|Non-dissipative battery charger equalizer|
    WO2004088773A1|1993-07-22|2004-10-14|Kenichi Miyamoto|Hermetically sealed battery|
    US5478668A|1993-11-30|1995-12-26|Bell Communications Research Inc.|Rechargeable lithium battery construction|
    AU691507B2|1993-09-17|1998-05-21|Nec Corporation|Charging and discharging circuit for preventing overcharge and overdischarge of rechargable battery pack consisting of a plurality of rechargable batteries|
    US5393617A|1993-10-08|1995-02-28|Electro Energy, Inc.|Bipolar electrochmeical battery of stacked wafer cells|
    US5618641A|1993-12-03|1997-04-08|Bipolar Power Corporation|Bipolar battery construction|
    US5504415A|1993-12-03|1996-04-02|Electronic Power Technology, Inc.|Method and apparatus for automatic equalization of series-connected batteries|
    US5487958A|1993-12-06|1996-01-30|Tura; Drew|Interlocking frame system for lithium-polymer battery construction|
    EP0969536A3|1994-03-03|2003-10-08|Japan Storage Battery Company Limited|Battery|
    DE4407156C1|1994-03-04|1995-06-08|Deutsche Automobilgesellsch|Electric storage battery housing for electrically-driven automobile|
    JP3389670B2|1994-03-11|2003-03-24|日産自動車株式会社|Series connection circuit of secondary battery|
    US5346786A|1994-03-21|1994-09-13|Hodgetts Philip J|Modular rack mounted battery system|
    JPH07263015A|1994-03-24|1995-10-13|Yuasa Corp|Lead-acid battery|
    US5670272A|1994-03-31|1997-09-23|Valence Technology, Inc.|Battery packaging for flat cell batteries having a compressing material for the cell stack|
    US5384212A|1994-04-25|1995-01-24|Globe-Union Inc.|Flex-rib plaques for batteries|
    US5567539A|1994-05-23|1996-10-22|Fuji Photo Film Co., Ltd.|Non-aqueous secondary cell|
    DE4419281C1|1994-06-01|1995-12-14|Daimler Benz Ag|High temperature battery|
    US5610495A|1994-06-20|1997-03-11|Motorola, Inc.|Circuit and method of monitoring battery cells|
    FR2721407B1|1994-06-21|1996-08-02|Renault|Method and device for controlling the insulation of a direct current electrical network.|
    FR2722031B1|1994-07-04|1996-08-23|Accumulateurs Fixes|REGULATOR DEVICE FOR ELECTRICAL BATTERY|
    US5548200A|1994-07-06|1996-08-20|Norvik Traction Inc.|Universal charging station and method for charging electric vehicle batteries|
    JPH0823637A|1994-07-06|1996-01-23|Mitsumi Electric Co Ltd|Detection unit for protection circuit of rechargeable battery and protection circuit|
    US5422200A|1994-07-27|1995-06-06|Hope; Stephen F.|Battery packaging construction for alkali metal multicell batteries|
    US5503948A|1994-08-02|1996-04-02|Microelectronics And Computer Technology Corporation|Thin cell electrochemical battery system; and method of interconnecting multiple thin cells|
    JP2895757B2|1994-08-05|1999-05-24|日本ミクロコーティング株式会社|Polishing equipment|
    US5594320A|1994-09-09|1997-01-14|Rayovac Corporation|Charge equalization of series connected cells or batteries|
    US5622789A|1994-09-12|1997-04-22|Apple Computer, Inc.|Battery cell having an internal circuit for controlling its operation|
    DE4433836C1|1994-09-22|1995-11-09|Daimler Benz Ag|Device for heating an interior of an electric vehicle|
    DE9415874U1|1994-09-29|1994-12-08|Volkswagen Ag|Battery test lead in an electric vehicle|
    US5595839A|1994-10-13|1997-01-21|Yardney Technical Products, Inc.|Bipolar lithium-ion rechargeable battery|
    US5643044A|1994-11-01|1997-07-01|Lund; Douglas E.|Automatic chemical and mechanical polishing system for semiconductor wafers|
    US5633573A|1994-11-10|1997-05-27|Duracell, Inc.|Battery pack having a processor controlled battery operating system|
    US5619417A|1994-11-23|1997-04-08|Chrysler Corporation|Battery monitoring system for an electric vehicle|
    JPH08153541A|1994-11-28|1996-06-11|Mitsubishi Cable Ind Ltd|Lithium secondary battery|
    US5528122A|1994-11-29|1996-06-18|Ventron Corporation|Battery voltage equalizer circuit|
    GB2295718A|1994-12-02|1996-06-05|Silent Power Gmbh|Arrangements of batteries comprising an array of cells interconnected to give the required energy storage/operational voltage|
    US5600230A|1994-12-15|1997-02-04|Intel Corporation|Smart battery providing programmable remaining capacity and run-time alarms based on battery-specific characteristics|
    US5568039A|1994-12-16|1996-10-22|Motorola, Inc.|Apparatus and method of providing an initiation voltage to a rechargeable battery system|
    US5532087A|1994-12-22|1996-07-02|Motorola, Inc.|Electrochemical cell|
    US5623196A|1994-12-27|1997-04-22|Motorola, Inc.|Apparatus and method of simulating high battery temperature in a rechargeable battery|
    JPH08203501A|1995-01-25|1996-08-09|Hitachi Maxell Ltd|Lithium secondary battery|
    US5569550A|1995-02-03|1996-10-29|Motorola, Inc.|Battery pack having under-voltage and over-voltage protection|
    DE19503917C2|1995-02-07|1996-11-21|Mc Micro Compact Car Ag|Electronic battery monitoring device|
    US5654622A|1995-02-16|1997-08-05|Sanyo Electric Co., Ltd.|Secondary battery charging method and apparatus which controls protecting voltage level of battery protecting circuit|
    US5563002A|1995-02-21|1996-10-08|Motorola, Inc.|Programmable battery|
    US5612153A|1995-04-13|1997-03-18|Valence Technology, Inc.|Battery mask from radiation curable and thermoplastic materials|
    US5593604A|1995-05-04|1997-01-14|Motorola, Inc.|Method of resistance welding thin elements|
    US5561380A|1995-05-08|1996-10-01|Chrysler Corporation|Fault detection system for electric automobile traction system having floating ground|
    US5650240A|1995-08-21|1997-07-22|Hughes Aircraft Company|Multicell battery system with individually controllable cell bypasses|
    US5556576A|1995-09-22|1996-09-17|Kim; Yong C.|Method for producing conductive polymeric coatings with positive temperature coefficients of resistivity and articles made therefrom|
    US5631537A|1995-10-17|1997-05-20|Benchmarq Microelectronics|Battery charge management/protection apparatus|
    JPH09139214A|1995-11-16|1997-05-27|Ricoh Co Ltd|Current collector sheet for battery and electrode using this current collector sheet|
    US5534366A|1995-11-22|1996-07-09|Motorola, Inc.|Modular battery pack|
    JPH09171823A|1995-12-20|1997-06-30|Ngk Insulators Ltd|Active material body of electrochemical element, active member of electrochemical element, and active material of electrochemical element|
    US5626990A|1996-02-02|1997-05-06|Portable Energy Products, Inc.|Recombinant lead acid battery and method of making same|
    DE19618897B4|1996-05-10|2006-04-20|Varta Automotive Systems Gmbh|Circuit arrangement for determining the insulation resistance of an accumulator battery|
    JPH1012224A|1996-06-20|1998-01-16|Yamauchi Corp|Thin layer electrode manufacturing press roller, thin layer electrode manufacturing press device using this roller and manufacture of this thin layer electrode|
    JPH1050300A|1996-07-30|1998-02-20|Yamauchi Corp|Press roll for manufacturing thin electrode, press device for manufacturing thin electrode using the roll, and manufacture of thin electrode|
    JPH113701A|1997-06-09|1999-01-06|Asahi Chem Ind Co Ltd|Manufacture of battery electrode and equipment thereof|
    JP6036756B2|2013-08-30|2016-11-30|Ｊｆｅスチール株式会社|High strength hot rolled steel sheet and method for producing the same|US6528204B1|1999-09-22|2003-03-04|Koninklijke Philips Electronics N.V.|Lithium secondary battery comprising individual cells with one another, as well as watches, computers and communication equipment provided with a battery|
    US20020110733A1|2000-08-07|2002-08-15|Johnson Lonnie G.|Systems and methods for producing multilayer thin film energy storage devices|
    US6402796B1|2000-08-07|2002-06-11|Excellatron Solid State, Llc|Method of producing a thin film battery|
    US7204862B1|2002-01-10|2007-04-17|Excellatron Solid State, Llc|Packaged thin film batteries and methods of packaging thin film batteries|
    US7960054B2|2002-01-10|2011-06-14|Excellatron Solid State Llc|Packaged thin film batteries|
    US6852139B2|2003-07-11|2005-02-08|Excellatron Solid State, Llc|System and method of producing thin-film electrolyte|
    US6886240B2|2003-07-11|2005-05-03|Excellatron Solid State, Llc|Apparatus for producing thin-film electrolyte|
    KR100570677B1|2003-09-26|2006-04-12|삼성에스디아이 주식회사|Rechargeable lithium battery|
    US7696089B1|2004-05-11|2010-04-13|Johnson Research & Development Co., Inc.|Passivated thin film and method of producing same|
    US9689820B2|2011-10-25|2017-06-27|Purdue Research Foundation|Thermography for battery component quality assurance|
    DE102014210803A1|2014-06-05|2015-12-17|Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.|Electric energy storage element, method and apparatus for its manufacture|
    WO2016123531A1|2015-01-30|2016-08-04|The Regents Of The University Of California|Modified charge collectors and cell cases for enhanced battery-cell robustness|
    CN111656577A|2018-01-17|2020-09-11|远景Aesc能源元器件有限公司|Electrode for lithium ion battery and lithium ion battery|
    US10903478B2|2018-04-06|2021-01-26|GM Global Technology Operations LLC|Protective coating for lithium-containing electrode and methods of making the same|
    法律状态:
    2003-01-23| STCF| Information on status: patent grant|Free format text: PATENTED CASE |
    2003-08-19| CC| Certificate of correction|
    2006-07-26| FPAY| Fee payment|Year of fee payment: 4 |
    2008-09-01| AS| Assignment|Owner name: AVESTOR LIMITED PARTNERSHIP, CANADA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:HYDRO-QUEBEC;REEL/FRAME:021462/0276 Effective date: 20080605 |
    2008-09-02| AS| Assignment|Owner name: BATHIUM CANADA INC., CANADA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:AVESTOR LIMITED PARTNERSHIP;REEL/FRAME:021462/0307 Effective date: 20080604 |
    2010-07-26| FPAY| Fee payment|Year of fee payment: 8 |
    2014-07-28| FPAY| Fee payment|Year of fee payment: 12 |
    优先权:
    申请号 | 申请日 | 专利标题
    US08/989,502|US6235425B1|1997-12-12|1997-12-12|Apparatus and method for treating a cathode material provided on a thin-film substrate|
    US09/730,054|US6517591B2|1997-12-12|2000-12-05|Apparatus and method for treating a cathode material provided on a thin-film substrate|US09/730,054| US6517591B2|1997-12-12|2000-12-05|Apparatus and method for treating a cathode material provided on a thin-film substrate|
    [返回顶部]